A piezoresistive micro pressure sensor fabricated by commercial DPDM CMOS process | |
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學年 | 93 |
學期 | 2 |
出版(發表)日期 | 2005-03-01 |
作品名稱 | A piezoresistive micro pressure sensor fabricated by commercial DPDM CMOS process |
作品名稱(其他語言) | |
著者 | 楊龍杰; Yang, Lung-jieh; Lai, Chen-chun; Dai,Ching-liang; Chang, Pei-zen |
單位 | 淡江大學機械與機電工程學系 |
出版者 | 淡江大學 |
著錄名稱、卷期、頁數 | 淡江理工學刊=Tamkang journal of science and engineering 8(1), pp.67-73 |
摘要 | A piezoresistive pressure sensor with a chip area of 2 mm 4 mm has been fabricated by a standard CMOS process with additional MEMS post- process. The structure layers follow the design rules of the CMOS 0.8 m DPDM (Double-Polysilicon-Double-Metal) multiple-project-wafer foundry service provided by the Chip Implementation Center, Taiwan. We used a finite element method software ANSYS to analyze the mechanical behavior of the pressure sensor and used the commercial software CADENCE to design the structure layout. After the CMOS process and the MEMS post- process, two CMOS pressure sensors with different diaphragm thickness were packaged and tested. The sensitivities of sensors were measured as 0.53 mV/atm/V and 13.1 mV/atm/V with non-linearity less than 5% (FSO), and agree with the theoretical prediction qualitatively. |
關鍵字 | CMOS;MEMS;Post Process;Pressure Sensor |
語言 | en_US |
ISSN | 1560-6686 |
期刊性質 | 國內 |
收錄於 | |
產學合作 | |
通訊作者 | |
審稿制度 | 否 |
國別 | TWN |
公開徵稿 | |
出版型式 | ,紙本 |
相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/45668 ) |