CMOS microelectromechanical bandpass filters
學年 89
學期 2
出版（發表）日期 2001-05-01
作品名稱 CMOS microelectromechanical bandpass filters
作品名稱（其他語言）
著者 楊龍杰; Yang, Lung-jieh; Huang, Tsung-wei; Chang, Pei-zen
單位 淡江大學機械與機電工程學系
出版者 Elsevier
著錄名稱、卷期、頁數 Sensors and Actuators A: Physical 90(1-2), pp.148-152
摘要 This work fabricates a laminated-suspension microelectromechanical filter, respectively, by a fully compatible CMOS 0.6 μm single poly triple metal (SPTM) process and CMOS 0.35 μm single poly quadri-metal (SPQM) process. Experimentally, due to the top metal layer being used as the etch-resistant mask during the subsequent dry etching. Therefore, this study performs maskless etching with plasma and obtains excellent results including high selectivity and full release of the structure. Additionally, the microelectromechanical filter can be driven by applying low-voltage of around 5 V and a measured center frequency of around 13.1 kHz and a quality factor of around 1871 were obtained for a single-comb resonator operated in air. The filter successful proposed herein has a monolithic integration capability with the relative electric circuits in the standard CMOS 0.35 μm process.
關鍵字 Microelectromechanical filter;CMOS;Maskless;Monolithic integration
語言 en
ISSN 0924-4247
期刊性質 國內
收錄於
產學合作
通訊作者
審稿制度 否
國別 TWN
公開徵稿
出版型式 ,電子版
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