Electronic structure and hardening mechanism of Si-doped/undoped diamond-like carbon films
學年 93
學期 2
出版（發表）日期 2005-06-22
作品名稱 Electronic structure and hardening mechanism of Si-doped/undoped diamond-like carbon films
作品名稱（其他語言）
著者 Ray, S. C.; Okpalugo, T. I. T.; Papakonstantinou, P.; Bao, C. W.; Tsai, H. M.; Chiou, J. W.; 彭維鋒; Pong, W. F.; McLaughlin, J. A.; Wang,W. J.
單位 淡江大學物理學系
出版者 Elsevier
著錄名稱、卷期、頁數 Thin Solid Films 482(1-2), pp.242-247
摘要 In this article, we have investigated the electronic structures of silicon-doped and undoped diamond-like carbon (DLC) thin films using Fourier transform infrared (FTIR) spectra, Raman spectra, photoluminescence (PL), and X-ray absorption near edge structure (XANES) spectroscopy. The films were deposited by Plasma-Enhanced Chemical Vapour Deposition (PECVD) method in argon atmosphere using C2H2 and/or Si(CH3)4 vapour precursors. Raman spectra displayed a decrease in (ID/IG) ratio for films synthesized using Si(CH3)4 vapour, indicative of the formation of more diamond-like (sp3 rich) films. The PL intensities and the full width at half maximum (FWHM) of the PL band increased, whereas PL peak position shifted towards lower energies when the Si incorporation was increased in the film. FTIR spectra revealed an increase in Si–Hn and C–Hn bonding intensity at 2100 cm−1 and 2900 cm−1, respectively, with increased Si incorporation. Hardness as well as the Young's modulus changed with not only the sp2 content present in the film, but also decrease in the three-dimensional interlinks of the C–C atomic bond structure by the C–Hn and Si–Hn weaker bonds.
關鍵字 DLC thin film;FTIR;Raman;XANES
語言 en
ISSN 0040-6090
期刊性質 國內
收錄於
產學合作
通訊作者
審稿制度 否
國別 TWN
公開徵稿
出版型式 ,電子版
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