期刊論文
| 學年 | 107 |
|---|---|
| 學期 | 2 |
| 出版（發表）日期 | 2019-07-23 |
| 作品名稱 | Linear profiles monitoring in the presence of nonnormal random errors |
| 作品名稱（其他語言） | |
| 著者 | Chung‐I Li; Tzong‐Ru TsaI |
| 單位 | |
| 出版者 | |
| 著錄名稱、卷期、頁數 | Quality and Reliability Engineering International 2019, p.1-14 |
| 摘要 | Profile monitoring is a technique to test the stability of the relationship between a response variable and explanatory variables over time. The most relevant linear profile monitoring methods have been constructed using the normality assumption. However, the normality assumption could be violated in many quality control applications. In this study, we consider a situation in which the random errors in a linear profile model follow a skew‐normal distribution. The skew‐normal distribution is a generalized version of the normal distribution. A new Shewhart‐type chart and exponentially weighted moving average (EWMA) chart, named the ShewhartR and EWMAR charts, respectively, are constructed based on residuals to monitor the parameters of linear profile model. The simulation results show that the multivariate EWMA chart is sensitive to the normality assumption and that the proposed ShewhartR and EWMAR charts have good ability to detect big and small‐to‐moderate process shifts, respectively. An example using photo mask techniques in semiconductor manufacturing is provided to illustrate the applications of the ShewhartR and EWMAR charts. |
| 關鍵字 | EWMA;chart generalized likelihood ratio test;linear profile;Shewhart‐type residual chart;skew normal distribution |
| 語言 | en_US |
| ISSN | |
| 期刊性質 | 國外 |
| 收錄於 | SCI Scopus |
| 產學合作 | |
| 通訊作者 | |
| 審稿制度 | 否 |
| 國別 | USA |
| 公開徵稿 | |
| 出版型式 | ,電子版 |
| 相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/117007 ) |